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Nanoscale bilayer mechanical lithography using water as developer

Abstract:

Sustainability has become a critical concern in the semiconductor industry as hazardous wastes released during the manufacturing process of semiconductor devices have an adverse impact on human beings and the environment. The use of hazardous solvents in existing fabrication processes also restricts the use of polymer substrates because of their low chemical resistance to such solvents. Here, we demonstrate an environmentally friendly mechanical, bilayer lithography that uses just water for d...

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Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1021/acs.nanolett.1c00251

Authors


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Institution:
University of Oxford
Department:
Materials
Oxford college:
Wolfson College
Role:
Author
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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
ORCID:
0000-0003-0015-0335
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
ORCID:
0000-0001-9974-1607
More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
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John Fell Fund More from this funder
Publisher:
American Chemical Society Publisher's website
Journal:
Nano Letters Journal website
Volume:
21
Issue:
9
Article number:
1c00251
Pages:
3827-3834
Publication date:
2021-04-22
Acceptance date:
2021-04-06
DOI:
EISSN:
1530-6992
ISSN:
1530-6984
Language:
English
Keywords:
Pubs id:
1172832
Local pid:
pubs:1172832
Deposit date:
2021-04-22

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