Journal article
Nanoscale bilayer mechanical lithography using water as developer
- Abstract:
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Sustainability has become a critical concern in the semiconductor industry as hazardous wastes released during the manufacturing process of semiconductor devices have an adverse impact on human beings and the environment. The use of hazardous solvents in existing fabrication processes also restricts the use of polymer substrates because of their low chemical resistance to such solvents. Here, we demonstrate an environmentally friendly mechanical, bilayer lithography that uses just water for d...
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- Publication status:
- Published
- Peer review status:
- Peer reviewed
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(Version of record, 7.8MB)
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- Publisher copy:
- 10.1021/acs.nanolett.1c00251
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Authors
Funding
+ Engineering and Physical Sciences Research Council
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Grant:
EP/M015173/1
EP/J018694/1
EP/R001677/1
John Fell Fund
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Bibliographic Details
- Publisher:
- American Chemical Society Publisher's website
- Journal:
- Nano Letters Journal website
- Volume:
- 21
- Issue:
- 9
- Article number:
- 1c00251
- Pages:
- 3827-3834
- Publication date:
- 2021-04-22
- Acceptance date:
- 2021-04-06
- DOI:
- EISSN:
-
1530-6992
- ISSN:
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1530-6984
Item Description
- Language:
- English
- Keywords:
- Pubs id:
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1172832
- Local pid:
- pubs:1172832
- Deposit date:
- 2021-04-22
Terms of use
- Copyright holder:
- Y Shu et al.
- Copyright date:
- 2021
- Rights statement:
- © 2021 The Authors. Published by American Chemical Society. This paper is open access via Creative Commons licensing.
- Licence:
- CC Attribution (CC BY)
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